UHN15-1EL Designed for Excimer/Femtosecond Laser G

High-purity N₂ generator for excimer/femtosecond lasers, integrating imported molecular sieves with three-stage purification for 99.99% purity. Covers chamber purging and optics protection—ensuring superior precision and extended equipment life.

| Product Features

◆  Efficient SFP technology: fast startup, reduced contamination.

◆  Precision-fit for excimer/femtosecond lasers.

◆  Imported key components for stable, long-life performance.

◆  Strict quality control: 99.99% purity, -60℃ dew point.

◆  Compact design for lab or industrial use.

|Product Application

◆   Designed for excimer and femtosecond laser generators, supplies high-purity nitrogen as purge gas to ensure stable and efficient laser output for advanced research applications.

| Technical Specifications