UHN5-1EL Designed for Excimer/Femtosecond Laser Ge

High-purity N₂ generator for excimer/femtosecond lasers, integrating imported molecular sieves with three-stage purification for 99.999% purity. Covers chamber purging and optics protection—ensuring superior precision and extended equipment life.

| Product Features

◆  Efficient SFP technology: fast startup, reduced contamination.

◆ Extended molecular sieve life, higher efficiency.

◆ Ultra-quiet: ≤60 dB, ideal for labs/medical use.

◆ Stable flow: precise control for consistent output.

◆ Ultra-high purity: meets advanced application standards.

◆ Smart IoT: remote monitoring & intelligent management.

|Product Application

◆  Designed for excimer and femtosecond laser generators, supplies high-purity nitrogen as purge gas to ensure stable and efficient laser output for advanced research applications.

| Technical Specifications